The Winfab platform maintains a 1000 m², class 1 / ISO 3 cleanroom (in critical work area). Most of the tools available in the cleanroom are shared, and then accessible to all registered users after a proper training.
Winfab offers an access to wide range of state-of-the-art techniques for thin-films deposition, thin-films etching, surface patterning, micromachining and back-end processes.
Active in the field of microelectronics since the early 70's, the Winfab platform has diversified its activity over years. Today, Winfab supports more than 70 researchers active in various fields, such as SOI-CMOS technology, microelectromechanical systems (MEMS), lab-on-chip devices, sensors, solar cells, batteries, bio-technologies, nanoelectronics, 2D materials (graphene, ...), photonics devices, organic electronics, ...
Services can take various forms, including access to the infrastructures, process development, processing from a single to a complex set of process steps.
Using a homemade recipe, we etch the epoxy package of electronic components in order to reveal the dies to be tested under ions high-energy beam for Rad-hard space certification.
Can be done on individual components or direclty on PCB
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Our equipments and long-term expertise allow the fabrication of complex CMOS devices with co-integration of other technologies like sensors, ...
We have developed production capabilities of continuous monolayer graphene sheets on 5 x 5 cm² copper foils or thin films with domains greater than 1 mm.
Find below some real case examples
Reproducing a state-of-the-art published device to be tested in a commercial application.
Development of a transparent interdigitated capacitive sensor for a kinesiotherapy application.
Industries, Research Centers or Academic Research groups that wish to use the Winfab platform for any type of services, including processing, process development or direct access to the cleanroom infrastructures can directly contact us.
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