Back-end process

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Tousimis Automegasamdri-915B

Description: Allows samples drying without stiction problems

Sample holder: up to 1 x 6" wafers

Presi Mecapol P600

Description: Automatic chemical-mechanical polishing equipement

Sample holder: from 3" to 8" wafers

G&N MPS 2R 300S

Description: Abrasive thinning of semiconductor wafers

Sample holder: up to 8 x 3" wafers ( 1x6" after upgrade )

Precision: 3 μm

Tempress 602

Description: Dicing saw equipement

Sample holder: up to 4" wafers

Materials: Si, glass, quartz

Thickness: up to 1mm

Die: min. 2 x 2 mm2

K&S 4700AD

Description: Wedge bonding equipement

Wire: 20 μm Al or Au wire

Contact pads: min. 70 x 70 μm2