Resist Coating
Description: Automated spin-coating platform, including resist spin-coating, baking and development.
Sample holder: up 25 x 3" wafers or 8" wafers
Description: Semi-automated spin- coating platform, including resist spin-coating and baking.
Sample holder: 3" wafers
Description: Manual spin-coater dedicated to e-beam lithography processes.
Sample holder: from 3 x 3 mm2 to 8" wafers
Description: Manual spin-coater dedicated to nanoimprint lithography processes.
Sample holder: from 3 x 3 mm2 to 3" wafers
Description: Heating oven dedicated to HMDS adherence promotion or deticated for baking out samples.
Sample holder: max 25 x 3" wafers
Chamber size: 12"x12"x12"
Temperature: up to 200°C
Description: Semi-automated hot plate for resist baking.
Sample holder: up to 4" wafers
Temperature: up to 200°C