Micromachining
Funding: Feder/Wallonia
Description: Picosecond laser with two operational wavelenghts (355 nm UV and 1064 nm IR)
Maximum sample size: 70 x 30 cm
Resolution: beam diameter down to 10 μm (UV) and 27 μm (IR)
Materials: metal films (Ni, Cu, ...), Quartz, Silicon, RF substrates, Nitinol, Polyimide ...
Funding: FNRS
Description: The dual beam FIB-SEM system allows devices nanomachining using ion milling and ion beam-assisted deposition of materials (C, W, Pt or SiO2). The SEM column allows in-situ characterization of the device.
Sample holder: up to 3" wafers
Resolution: down to 10 nm