Furnaces

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Koyo Thermo Systems - 1

Funding: Feder/Wallonia

Description: Vertical furnace for oxidation of thin films

Sample holder: 25 x 3" wafers

Parameter: wet and dry oxidation

Tempress - 1

Description: Horizontal furnace for annealing, degasing and thin film oxidation

Sample holder: 3" wafers

Parameter: wet and dry oxidation

MOS and SiC furnaces

Description: Horizontal furnaces for contaminated MOS oxidations and annealing

Sample holder: 3" wafers

Parameter: up to 1000°C, dry oxidation

Addax XM 4

Description: rapid thermal processor

Sample holder: 3" wafers

Temperature/rate up to 1050°C

Atmosphere N2, Ar, N2/H2, Ar/H2

ULVAC Mila-5000

Description: Table-top rapid heating and cooling system

Sample holder: max 2 x 2 cm2

Temperature/rate up to 1200°C at 50°C/s

Atmosphere N2, Ar, N2/H2, Ar/H2 or vacuum

PolySi doping furnace

Description: Horizontal furnace for poly-silicon doping with a solid source of phosphorus (P2O5)

Sample holder: 3" wafers

Parameter: up to 1000°C

Alu furnace

Description: Horizontal furnace dedicated to metals annealing

Sample holder: 3" wafers

Parameter: up to 1000°C